UDRI Surface Analysis researchers have access to an X-Ray Photoelectron Spectroscopy (XPS) system to fully characterize surface and near-surface composition and provide chemical state information for various material substrates. This method is based on energy spectroscopy of emitted electrons. Depth profiling perpendicular to the surface can also be obtained via ion-beam sputtering. XPS is a vacuum method suitable for a wide variety of materials such as metals, semiconductor materials and devices, catalysts, ceramics, powders, polymers, composite materials, tissues and cultures, and catalysts. XPS is useful for a range of applications including bulk and thin film composition, tribology, coatings, alloying, bonding, oxidation, corrosion and contamination, catalysis, and biological samples.